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PVD coating machines
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PVD deposition machine / sputtering / thin-film - PL70
General Information
1-linear-cathode compact hardcoating unit
Based on PLATIT cathodic ARC-technology
Coating...
1-linear-cathode compact hardcoating unit
Based on PLATIT cathodic ARC-technology
Coating...
PVD deposition machine / sputtering / thin-film - PL70
General Information
1-linear-cathode compact hardcoating unit
Based on PLATIT cathodic ARC-technology
Coating...
1-linear-cathode compact hardcoating unit
Based on PLATIT cathodic ARC-technology
Coating...
PVD deposition machine / sputtering / thin-film / with rotating cathodes - 1 870 x 1 320 x 2 155 mm | 20 kW | Π80
General Information
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS) above 200°C,...
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS) above 200°C,...
PVD deposition machine / sputtering / thin-film / with rotating cathodes - 1 870 x 1 320 x 2 155 mm | 20 kW | Π80
General Information
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS) above 200°C,...
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS) above 200°C,...
PVD deposition machine / sputtering / thin-film / with rotating cathodes - 1 890 x 1 500 x 2 120 mm | 30 kW | Π111
General Information
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS)...
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS)...
PVD deposition machine / sputtering / thin-film / with rotating cathodes - 1 890 x 1 500 x 2 120 mm | 30 kW | Π111
General Information
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS)...
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS)...
PVD deposition machine / diamond-like carbon / vacuum - 1890 x 1598 x 2619 mm | Π211
General Information
Dedicated coating unit for DLC3 (ta-C) coatings
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating temperature 50°C to 500°C
πsCOAT® - New Innovation
π smooth COATING: Straight forward ARC filtering
DLC3 Coatings
Standard coatings: VIc3® , cVIc3®...
Dedicated coating unit for DLC3 (ta-C) coatings
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating temperature 50°C to 500°C
πsCOAT® - New Innovation
π smooth COATING: Straight forward ARC filtering
DLC3 Coatings
Standard coatings: VIc3® , cVIc3®...
PVD deposition machine / diamond-like carbon / vacuum - 1890 x 1598 x 2619 mm | Π211
General Information
Dedicated coating unit for DLC3 (ta-C) coatings
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating temperature 50°C to 500°C
πsCOAT® - New Innovation
π smooth COATING: Straight forward ARC filtering
DLC3 Coatings
Standard coatings: VIc3® , cVIc3®...
Dedicated coating unit for DLC3 (ta-C) coatings
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating temperature 50°C to 500°C
πsCOAT® - New Innovation
π smooth COATING: Straight forward ARC filtering
DLC3 Coatings
Standard coatings: VIc3® , cVIc3®...
PVD deposition machine / sputtering / thin-film / with rotating cathodes - 2 350 x 1 660 x 2 300 mm | 45 kW | Π311
General Information
Compact hard coating unit
Based on the brand new PLATIT technologies:
LARC® : LAteral Rotating ARC Cathodes
CERC®: CEntral Rotating ARC Cathode
Coating on tool steels (TS) above 230 °C,
high speed steels (HSS)...
Compact hard coating unit
Based on the brand new PLATIT technologies:
LARC® : LAteral Rotating ARC Cathodes
CERC®: CEntral Rotating ARC Cathode
Coating on tool steels (TS) above 230 °C,
high speed steels (HSS)...
PVD deposition machine / sputtering / thin-film / with rotating cathodes - 2 350 x 1 660 x 2 300 mm | 45 kW | Π311
General Information
Compact hard coating unit
Based on the brand new PLATIT technologies:
LARC® : LAteral Rotating ARC Cathodes
CERC®: CEntral Rotating ARC Cathode
Coating on tool steels (TS) above 230 °C,
high speed steels (HSS)...
Compact hard coating unit
Based on the brand new PLATIT technologies:
LARC® : LAteral Rotating ARC Cathodes
CERC®: CEntral Rotating ARC Cathode
Coating on tool steels (TS) above 230 °C,
high speed steels (HSS)...
Magnetron for ion sputtering
These rectangular magnetrons are typically designed with a side-to-side sweeping motion which is exploited to enhance target utilization. Sweeping can occur in any direction or combination...
Magnetron for ion sputtering
These rectangular magnetrons are typically designed with a side-to-side sweeping motion which is exploited to enhance target utilization. Sweeping can occur in any direction or combination of directions, but is usually limited to side-to-side. Target utilization for this type of magnetron is superior to that of static planar units, but can still be limited by cross corner or turn around trenching. Magnetic flux tunnel shaping can be incorporated to minimize or eliminate these production hindering features. Our patented Quadrature technology can also be integrated to:
Sputter Through Thicker Targets
Sputter Through Magnetic Targets
Increase Deposition Rates
Lower Operating Voltages/Power
Sputter Through Thicker Targets
Sputter Through Magnetic Targets
Increase Deposition Rates
Lower Operating Voltages/Power
PVD deposition machine / sputtering
1. Anhydrous marks cleansing.
2. Demand for mining clean room construction...
2. Demand for mining clean room construction...
PVD deposition machine / sputtering
1. Anhydrous marks cleansing.
2. Demand for mining clean room construction method
1.SUS skeleton polished.
2. Complete machine PP closure plate material.
3. Wind Semi-hermetic cover design, good ventilation effects, operating convenience.
Application:
PVD sputtering processing
2. Demand for mining clean room construction method
1.SUS skeleton polished.
2. Complete machine PP closure plate material.
3. Wind Semi-hermetic cover design, good ventilation effects, operating convenience.
Application:
PVD sputtering processing