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PVD coating machines
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PVD deposition machine / sputtering / thin-film / vacuum
The fully automated deposition plants of the VERA series have been developed by VTD for industrial use. They are particularly suitable for the inexpensive high-precision optical coating of planar and convex components.
The equipment in each individual deposition plant is precisely customised to the requirements of the respective user. Various applications are possible in terms of...
The equipment in each individual deposition plant is precisely customised to the requirements of the respective user. Various applications are possible in terms of...
PVD deposition machine / sputtering / thin-film / vacuum
The fully automated deposition plants of the VERA series have been developed by VTD for industrial use. They are particularly suitable for the inexpensive high-precision optical coating of planar and convex components.
The equipment in each individual deposition plant is precisely customised to the requirements of the respective user. Various applications are possible in terms of both the substrates to be coated and the multilayer systems to be deposited.
The chamber sizes vary between 700 and 2,000 mm.
The high-vacuum is generated with pump combinations, mostly based on an oil diffusion pump or refrigerator cryo-pump, that have been tried and tested in industry.
Various substrate holders such as different calottes or pallets with a variable rotary or planetary drive ensure a uniform film distribution in combination with film thickness correction shutters.
Various pre-treatment devices provide good adhesion conditions.
The actual coating is carried out with the aid of vapour sources (electron-beam and/or resistance evaporators) and often also involves an ion or plasma source for so-called ion-assisted deposition (IAD). Sputtering and ion beam sputtering are alternative coating procedures.
Devices for determining and limiting the film thickness and controlling the overgrowing speed are other important process components. Additional optical measuring systems are used for particularly sophisticated applications.
Smaller plants are available for laboratory operation.
The equipment in each individual deposition plant is precisely customised to the requirements of the respective user. Various applications are possible in terms of both the substrates to be coated and the multilayer systems to be deposited.
The chamber sizes vary between 700 and 2,000 mm.
The high-vacuum is generated with pump combinations, mostly based on an oil diffusion pump or refrigerator cryo-pump, that have been tried and tested in industry.
Various substrate holders such as different calottes or pallets with a variable rotary or planetary drive ensure a uniform film distribution in combination with film thickness correction shutters.
Various pre-treatment devices provide good adhesion conditions.
The actual coating is carried out with the aid of vapour sources (electron-beam and/or resistance evaporators) and often also involves an ion or plasma source for so-called ion-assisted deposition (IAD). Sputtering and ion beam sputtering are alternative coating procedures.
Devices for determining and limiting the film thickness and controlling the overgrowing speed are other important process components. Additional optical measuring systems are used for particularly sophisticated applications.
Smaller plants are available for laboratory operation.