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Electron spectrometers: AES, XPS, EELS...
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X-ray photoelectron spectrometer - PHI Quantera II
The Quantera II is the next generation of PHI’s highly successful scanning XPS microprobe product line. The Quantera II provides high sensitivity large and micro-area spectroscopy,...
X-ray photoelectron spectrometer - PHI Quantera II
The Quantera II is the next generation of PHI’s highly successful scanning XPS microprobe product line. The Quantera II provides high sensitivity large and micro-area spectroscopy,...
Auger spectrometer - PHI 710
The PHI 710 Scanning Auger Nanoprobe provides high performance Auger (AES) spectral analysis, Auger imaging, and sputter depth profiling of complex materials including: nanomaterials,...
Auger spectrometer - PHI 710
The PHI 710 Scanning Auger Nanoprobe provides high performance Auger (AES) spectral analysis, Auger imaging, and sputter depth profiling of complex materials including: nanomaterials, catalysts, metals, and electronic devices.
The 710's field emission electron source provides less than 3 nm dark space resolution for secondary electron imaging. The coaxial geometry of the 710’s electron column and Cylindrical Mirror Analyzer (CMA) enables high Auger sensitivity over a broad range collection angles ensuring rapid and complete analysis routine flat samples as well as samples with complex shapes or high surface roughness. A high energy resolution spectroscopy capability is available when needed.
The 710's field emission electron source provides less than 3 nm dark space resolution for secondary electron imaging. The coaxial geometry of the 710’s electron column and Cylindrical Mirror Analyzer (CMA) enables high Auger sensitivity over a broad range collection angles ensuring rapid and complete analysis routine flat samples as well as samples with complex shapes or high surface roughness. A high energy resolution spectroscopy capability is available when needed.
X-ray photoelectron spectrometer - PHI VersaProbe II
PHI VersaProbe II Scanning XPS Microprobe
Overview
The VersaProbe II is the next generation of PHI's highly successful Multi-Technique...
Overview
The VersaProbe II is the next generation of PHI's highly successful Multi-Technique...
X-ray photoelectron spectrometer - PHI VersaProbe II
PHI VersaProbe II Scanning XPS Microprobe
Overview
The VersaProbe II is the next generation of PHI's highly successful Multi-Technique...
Overview
The VersaProbe II is the next generation of PHI's highly successful Multi-Technique...
Electron beam gun for surface analysis applications - 20 µA | NTI 1401
The Model NTI 1401 Ion Gun is ideal for use in surface chemistry experiments such as sample preparation and depth profiling with Auger and XPS. It can be used with most...
Electron beam gun for surface analysis applications - 20 µA | NTI 1401
The Model NTI 1401 Ion Gun is ideal for use in surface chemistry experiments such as sample preparation and depth profiling with Auger and XPS. It can be used with most...
Electron beam gun for surface analysis applications - 2 kV | IG2
PHI Compatible: The RBD 04-165 Ion Source is interchangeable with the PHI 04-161 and 04-162 ion guns. The RBD 32-165 Ion Source Control is interchangeable with the PHI 20-045 control. As a result, the RBD Model 04-165 works with the PHI 20-045, and the PHI 04-161 and 04-162 ion guns work with the RBD Model 32-165.
Theory: The Model 04-165 Backfill Ion Source generates an energetic inert...
Theory: The Model 04-165 Backfill Ion Source generates an energetic inert...
Electron beam gun for surface analysis applications - 2 kV | IG2
PHI Compatible: The RBD 04-165 Ion Source is interchangeable with the PHI 04-161 and 04-162 ion guns. The RBD 32-165 Ion Source Control is interchangeable with the PHI 20-045 control. As a result, the RBD Model 04-165 works with the PHI 20-045, and the PHI 04-161 and 04-162 ion guns work with the RBD Model 32-165.
Theory: The Model 04-165 Backfill Ion Source generates an energetic inert...
Theory: The Model 04-165 Backfill Ion Source generates an energetic inert...
Electron beam gun for surface analysis applications - 2 - 20 µA | NTI 1407
The Model NTI 1407 Ion Gun features Duoplasmatron performance in an electron impact ionization ion gun. By means...
Electron beam gun for surface analysis applications - 2 - 20 µA | NTI 1407
The Model NTI 1407 Ion Gun features Duoplasmatron performance in an electron impact ionization ion gun. By means of changeable apertures in the optics column, a wide range of beam currents and spot sizes may be obtained. At a beam energy of 5 keV, beam current may be adjusted from 2 uA into a 20 um diameter spot to 20 uA into a 100 um diameter spot.
The optics column includes an integral Faraday cup for beam current measurement
The optics column includes an integral Faraday cup for beam current measurement
Electron beam gun for surface analysis applications - 100 - 3 000 eV | EG3000
The LK Technologies Model EG3000 Electron Gun with matching control electronics is suitable for a variety of surface analysis applications such as Auger electron spectroscopy, electron scattering and diffraction experiments, and charge neutralization. The electron beam energy can be...
Electron beam gun for surface analysis applications - 100 - 3 000 eV | EG3000
The LK Technologies Model EG3000 Electron Gun with matching control electronics is suitable for a variety of surface analysis applications such as Auger electron spectroscopy, electron scattering and diffraction experiments, and charge neutralization. The electron beam energy can be...
Spectrometer / reflection high-energy electron diffraction - 30 keV | RDA series
FEATURES OF THE RDA-002G/RDA-004P E-GUN & POWER SUPPLY SYSTEM
The RDA-002G E-gun and RDA-004P Power Supply have been designed and developed with careful consideration for operational...
The RDA-002G E-gun and RDA-004P Power Supply have been designed and developed with careful consideration for operational...
Spectrometer / reflection high-energy electron diffraction - 30 keV | RDA series
FEATURES OF THE RDA-002G/RDA-004P E-GUN & POWER SUPPLY SYSTEM
The RDA-002G E-gun and RDA-004P Power Supply have been designed and developed with careful consideration for operational efficiency.
A remote control box contains both an accelerating voltage and emission current meter making it easy to confirm the diffraction image observed on the screen while safely and efficiently controlling all operational parameters of the screem.
Designed for easy maintenance, including filament replacement and beam alignment, there are no minor adjustments required from run-to-run.
Capable of varying the high voltage, filament, and XYZ lens of RHEED.
Surface treatment inside the electron gun enables outgas control from the electron gun.
The RDA-002G E-gun and RDA-004P Power Supply have been designed and developed with careful consideration for operational efficiency.
A remote control box contains both an accelerating voltage and emission current meter making it easy to confirm the diffraction image observed on the screen while safely and efficiently controlling all operational parameters of the screem.
Designed for easy maintenance, including filament replacement and beam alignment, there are no minor adjustments required from run-to-run.
Capable of varying the high voltage, filament, and XYZ lens of RHEED.
Surface treatment inside the electron gun enables outgas control from the electron gun.
Analyzer / electron spectrum - MINICMA™
PERFORMANCE FEATURES
Mounting on 2.75" (70 mm) flange
Retractable with linear motion feedthrough
General...
Mounting on 2.75" (70 mm) flange
Retractable with linear motion feedthrough
General...
Analyzer / electron spectrum - MINICMA™
PERFORMANCE FEATURES
Mounting on 2.75" (70 mm) flange
Retractable with linear motion feedthrough
General electron energy analysis including Auger and Photoelectron spectroscopy
Double-pass optics with energy resolution better than 1.5%
Ideal for experiments not accessible by conventional bulky analyzers
Combine with the RVL2000 LEED optics for a low-cost, high-performance LEED/Auger system
Mounting on 2.75" (70 mm) flange
Retractable with linear motion feedthrough
General electron energy analysis including Auger and Photoelectron spectroscopy
Double-pass optics with energy resolution better than 1.5%
Ideal for experiments not accessible by conventional bulky analyzers
Combine with the RVL2000 LEED optics for a low-cost, high-performance LEED/Auger system
Spectrometer / low-energy electron diffraction - ø 1.59 cm | RVL2000
Performance Features
* Precision construction with 4-grid tungsten optics
* Miniature 1.59 cm diameter electron gun
* 103 degree...
* Precision construction with 4-grid tungsten optics
* Miniature 1.59 cm diameter electron gun
* 103 degree...
Spectrometer / low-energy electron diffraction - ø 1.59 cm | RVL2000
Performance Features
* Precision construction with 4-grid tungsten optics
* Miniature 1.59 cm diameter electron gun
* 103 degree usable viewing angle
* 0.5% energy resolution
* Available with retractable optics
* Mounting flange has integral viewport and electrical feedthroughs
* Fully UHV compatible and bakeable
* Low noise, high performance Auger electronics with integral lock-in amplifier
* MCP versions for pA and nA current levels
* Complete range of options including shutter, CCD camera and software, 6 inch and 8 inch OD flange models
* Precision construction with 4-grid tungsten optics
* Miniature 1.59 cm diameter electron gun
* 103 degree usable viewing angle
* 0.5% energy resolution
* Available with retractable optics
* Mounting flange has integral viewport and electrical feedthroughs
* Fully UHV compatible and bakeable
* Low noise, high performance Auger electronics with integral lock-in amplifier
* MCP versions for pA and nA current levels
* Complete range of options including shutter, CCD camera and software, 6 inch and 8 inch OD flange models
Spectrometer / low-energy electron diffraction
Surface Science (UHV) Systems
In addition to surface analysis components LK Technologies specializes in the design and construction of complete UHV systems which often combine several surface...
In addition to surface analysis components LK Technologies specializes in the design and construction of complete UHV systems which often combine several surface...
Spectrometer / low-energy electron diffraction
Surface Science (UHV) Systems
In addition to surface analysis components LK Technologies specializes in the design and construction of complete UHV systems which often combine several surface analysis methods from LK components as well as other manufacturers.
Common elements of these systems are precision UHV chambers, a main pump (usually ion pump), an auxiliary pump (usually turbomolecular), a precision sample manipulator, a mounting framework with leveling feet and vacuum gauging. Optional components typically requested by the customer are a rapid sample introduction system (load lock) and bakeout control.
Please contact LK for more information and to discuss your custom system requirements. Below we show several examples of systems supplied in laboratories worldwide.
In addition to surface analysis components LK Technologies specializes in the design and construction of complete UHV systems which often combine several surface analysis methods from LK components as well as other manufacturers.
Common elements of these systems are precision UHV chambers, a main pump (usually ion pump), an auxiliary pump (usually turbomolecular), a precision sample manipulator, a mounting framework with leveling feet and vacuum gauging. Optional components typically requested by the customer are a rapid sample introduction system (load lock) and bakeout control.
Please contact LK for more information and to discuss your custom system requirements. Below we show several examples of systems supplied in laboratories worldwide.