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Ellipsometers
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Ellipsometer spectroscopic - 300 - 1 000 nm | SpecEl-2000-VIS
The SpecEl-2000-VIS Ellipsometer measures polarized light reflected from the surface of a substrate to determine the thickness and refractive index of the material as a function of wavelength. The SpecEl is controlled via...
Ellipsometer spectroscopic - 300 - 1 000 nm | SpecEl-2000-VIS
The SpecEl-2000-VIS Ellipsometer measures polarized light reflected from the surface of a substrate to determine the thickness and refractive index of the material as a function of wavelength. The SpecEl is controlled via...
Ellipsometry measuring device for the semiconductor industry - S3000A™
It incorporates Rudolph's Focused Beam ellipsometry technology...
Ellipsometry measuring device for the semiconductor industry - S3000A™
It incorporates Rudolph's Focused Beam ellipsometry technology which was developed for demanding diffusion applications. The value-engineered S3000A is designed for transparent film applications in the litho, etch, thin films, and CMP areas.
Ellipsometer laser
Ellipsometry is a method for determining the refractive index and extinction coefficients of a sample by measuring the change in polarization state...
Ellipsometer laser
Ellipsometry is a method for determining the refractive index and extinction coefficients of a sample by measuring the change in polarization state of surface reflected light. Film thickness and optical constants of an adsorption layer or oxide film on a substrate surface can be determined with exceptional sensitivity. Conventional interference spectroscopy utilizes light passed through separate optical paths, while ellipsometry is a form of interferometry that uses two vibrational components with the same optical path, providing measurements with excellent accuracy and sensitivity.