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CVD coating machines
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PECVD deposition machine / PVD - 350 kHz
Most important Features:
Combined PVD & PECVD process - to deposit very smooth coatings
Special Si containing gas line - controlled by additional Mass Flow Controller
Silicon...
Combined PVD & PECVD process - to deposit very smooth coatings
Special Si containing gas line - controlled by additional Mass Flow Controller
Silicon...
PECVD deposition machine / PVD - 350 kHz
Most important Features:
Combined PVD & PECVD process - to deposit very smooth coatings
Special Si containing gas line - controlled by additional Mass Flow Controller
Silicon...
Combined PVD & PECVD process - to deposit very smooth coatings
Special Si containing gas line - controlled by additional Mass Flow Controller
Silicon...
CVD deposition machine / thin-film - AltaCVD High Temp®
AltaCVD High Temp® performs HTCVD deposition commonly used in the fabrication of semiconductors, LED and MEMS. This is a flexible and cost effective system which can be used stand alone...
CVD deposition machine / thin-film - AltaCVD High Temp®
AltaCVD High Temp® performs HTCVD deposition commonly used in the fabrication of semiconductors, LED and MEMS. This is a flexible and cost effective system which can be used stand alone...
MOCVD deposition machine / thin-film - AltaCVD Advanced Materials®
AltaCVD Advanced Materials® performs Pulsed MOCVD/ALD deposition commonly used in the fabrication of Semiconductors, LED, MEMS. This is a flexible and cost effective system which can be used stand alone or combined with our innovative AltaCVD® chambers.
Processes
Processes have been thoroughly...
Processes
Processes have been thoroughly...
MOCVD deposition machine / thin-film - AltaCVD Advanced Materials®
AltaCVD Advanced Materials® performs Pulsed MOCVD/ALD deposition commonly used in the fabrication of Semiconductors, LED, MEMS. This is a flexible and cost effective system which can be used stand alone or combined with our innovative AltaCVD® chambers.
Processes
Processes have been thoroughly...
Processes
Processes have been thoroughly...
PECVD deposition machine / vacuum - AltaCVD Silane®
AltaCVD Silane® performs PECVD deposition commonly used in the fabrication of Semiconductors, LED, MEMS and Solar cells. This is a flexible and cost effective system which can be used stand alone or combined with...
PECVD deposition machine / vacuum - AltaCVD Silane®
AltaCVD Silane® performs PECVD deposition commonly used in the fabrication of Semiconductors, LED, MEMS and Solar cells. This is a flexible and cost effective system which can be used stand alone or combined with...
PECVD deposition machine / vacuum - AltaCVD Teos®
AltaCVD Teos® performs PECVD and HPCVD deposition commonly used in the fabrication of semiconductors, LED and MEMS. This is a flexible and cost effective system which can be used stand alone or combined with our innovatives AltaCVD®...
PECVD deposition machine / vacuum - AltaCVD Teos®
AltaCVD Teos® performs PECVD and HPCVD deposition commonly used in the fabrication of semiconductors, LED and MEMS. This is a flexible and cost effective system which can be used stand alone or combined with our innovatives AltaCVD®...
CVD deposition machine / thin-film - ICPCVD SI 500 D
The SI 500 D plasma deposition tool represents the leading edge for plasma enhanced chemical vapor deposition of dielectric films, a-Si, SiC, and other materials. It is based on PTSA plasma source, separated gas inlets for reaction gasses, dynamic temperature controlled substrate electrode, fully controlled vacuum...
CVD deposition machine / thin-film - ICPCVD SI 500 D
The SI 500 D plasma deposition tool represents the leading edge for plasma enhanced chemical vapor deposition of dielectric films, a-Si, SiC, and other materials. It is based on PTSA plasma source, separated gas inlets for reaction gasses, dynamic temperature controlled substrate electrode, fully controlled vacuum...
CVD deposition machine / thin-film - PECVD SI 500 PPD
The SI 500 PPD represents an advanced tool for plasma enhanced chemical vapor deposition of dielectric films, a‑Si, SiC, and other materials. It is based on planar capacitive coupled plasma source, vacuum loadlock, temperature controlled substrate electrode, optional available low frequency mixing, fully...
CVD deposition machine / thin-film - PECVD SI 500 PPD
The SI 500 PPD represents an advanced tool for plasma enhanced chemical vapor deposition of dielectric films, a‑Si, SiC, and other materials. It is based on planar capacitive coupled plasma source, vacuum loadlock, temperature controlled substrate electrode, optional available low frequency mixing, fully...
CVD deposition machine / thin-film - PECVD Depolab 200
Depolab 200 is the basic plasma enhanced chemical deposition (PECVD) tool by SENTECH combining the advantages of a parallel plate electrode design for uniform film deposition with cost effective design of direct load. Starting with standard applications on 2 to 8 wafers and...
CVD deposition machine / thin-film - PECVD Depolab 200
Depolab 200 is the basic plasma enhanced chemical deposition (PECVD) tool by SENTECH combining the advantages of a parallel plate electrode design for uniform film deposition with cost effective design of direct load. Starting with standard applications on 2 to 8 wafers and...