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MOCVD deposition machine / thin-film - TurboDisc MaxBright MHP
The TurboDisc® MaxBright® MHP™ GaN MOCVD Multi-Reactor System represents the latest modular high performance system specially designed to produce excellent yield of up to 20% within-wafer wavelength uniformity improvement over...
MOCVD deposition machine / thin-film - TurboDisc MaxBright MHP
The TurboDisc® MaxBright® MHP™ GaN MOCVD Multi-Reactor System represents the latest modular high performance system specially designed to produce excellent yield of up to 20% within-wafer wavelength uniformity improvement over...
MOCVD deposition machine / thin-film - TurboDisc® MaxBright® M™
GaN MOCVD Multi-Reactor System Platform gives out the industry's maximum footprint efficiency. MOCVD system is designed in such a way to produce high quality, high brightness emitting LEDs. MaxBright M gives up to 15% improved efficiency, serviceability...
MOCVD deposition machine / thin-film - TurboDisc® MaxBright® M™
GaN MOCVD Multi-Reactor System Platform gives out the industry's maximum footprint efficiency. MOCVD system is designed in such a way to produce high quality, high brightness emitting LEDs. MaxBright M gives up to 15% improved efficiency, serviceability...
MOCVD deposition machine / thin-film - TurboDisc K475
The Turbo Disc K475 metal organic chemical vapor deposition system is engineered to provide high volume production for some compound semiconductor devices. These devices include the...
MOCVD deposition machine / thin-film - TurboDisc K475
The Turbo Disc K475 metal organic chemical vapor deposition system is engineered to provide high volume production for some compound semiconductor devices. These devices include the CPV solar cells, red, orange, and yellow light emitting diodes, laser diodes, pseudomorphic high electron mobility transistors, and heterojunction bipolar transistors. It is designed with the expertise of Veeco in the industry, and the vital reactor design elements like a FlowFlanage, a RealTemp 200 temperature control, and a TurboDisc for producong high velocity laminar flows. This unit also comes with a system load lock that stays at a certain vacuum which lessens the frequency of downtime incidents in between the operational runs
MOCVD deposition machine / thin-film - TurboDisc® K465i HP™
The TurboDisc® K465i HP™ GaN MOCVD System offers higher yields and increased productivity. The system has a high performance reactor which has been designed in order to increase within-wafer...
MOCVD deposition machine / thin-film - TurboDisc® K465i HP™
The TurboDisc® K465i HP™ GaN MOCVD System offers higher yields and increased productivity. The system has a high performance reactor which has been designed in order to increase within-wafer...
MOCVD deposition machine / thin-film - TurboDisc® K465i™
The TurboDisc® K465i™ series is manufactured by Veeco, and is a Gan MOCVD...
MOCVD deposition machine / thin-film - TurboDisc® K465i™
The TurboDisc® K465i™ series is manufactured by Veeco, and is a Gan MOCVD...
PECVD deposition machine / vacuum - NPE-4000
NANO-MASTER, Inc. PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 8” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source...
PECVD deposition machine / vacuum - NPE-4000
NANO-MASTER, Inc. PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 8” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source...
MOCVD deposition machine / thin-film - NMC-3000/4000
Nano-Master, Inc. has developed the first Table Top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for InGaN and AlGaN deposition processes. The features...
MOCVD deposition machine / thin-film - NMC-3000/4000
Nano-Master, Inc. has developed the first Table Top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for InGaN and AlGaN deposition processes. The features...
PECVD deposition machine / diamond-like carbon / vacuum - 23 kVA | DLCcs
The Leybold Optics DLCcs is a high vacuum PECVD (Plasma Enhanced Chemical Vapour Deposition) system for precision optics applications. The DLCcs chambers are used by industry leaders to produce optical and thermal imaging...
PECVD deposition machine / diamond-like carbon / vacuum - 23 kVA | DLCcs
The Leybold Optics DLCcs is a high vacuum PECVD (Plasma Enhanced Chemical Vapour Deposition) system for precision optics applications. The DLCcs chambers are used by industry leaders to produce optical and thermal imaging systems. The Leybold Optics R&D and process team is your partner for customized processes.
Extremely hard layer surfaces
The system is designed for the production of diamond like hard carbon (DLC) layer coatings for IR anti-reflex applications, including but not limited to, germanium (Ge) and silicon (Si). The extremely hard DLC layer protects exposed optics surfaces and also increases infrared transmittance.
High accuracy with Optical Monitoring
The DLCcs features a very stable automatic coating process. The advanced optical layer monitoring guarantees unparalleled layer thickness, accuracy, and reproducibility.
Extremely hard layer surfaces
The system is designed for the production of diamond like hard carbon (DLC) layer coatings for IR anti-reflex applications, including but not limited to, germanium (Ge) and silicon (Si). The extremely hard DLC layer protects exposed optics surfaces and also increases infrared transmittance.
High accuracy with Optical Monitoring
The DLCcs features a very stable automatic coating process. The advanced optical layer monitoring guarantees unparalleled layer thickness, accuracy, and reproducibility.