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CVD deposition machine / thin-film - ULS series
The ULS Series is a range of CVD deposition machine from Acxys. The standard module is designed for depositing non-stochiometric silicon oxide with the use of an organic...
CVD deposition machine / thin-film - ULS series
The ULS Series is a range of CVD deposition machine from Acxys. The standard module is designed for depositing non-stochiometric silicon oxide with the use of an organic metal precursor. It also allows other film components to be studied. The deposition hardware is founded on the ULS design and receives an add-on part enabling precursor injection.
The machine provides think film deposition with either SiO2 or SiOx coatings. It can accommodate thickness from 50 to 1000 nm at a uniformity of +/- 2%. It also generates a medium to high processing speed. Furthermore, the machine is easy to use and can be easily installed on ULS hardware.
The machine provides think film deposition with either SiO2 or SiOx coatings. It can accommodate thickness from 50 to 1000 nm at a uniformity of +/- 2%. It also generates a medium to high processing speed. Furthermore, the machine is easy to use and can be easily installed on ULS hardware.
PECVD deposition machine / vacuum
Application
Plasma enhanced CVD of p-i-n tandem stack of amorphous hydrogenated silicon on metal foils for production of solar absorbing multi-layers.
Engineering and technology
The PECVD coating system is a roll-to-roll type production plant engineered for one-sided vacuum coating of up to 1,340 mm wide metal foils.
The deposition zone consists...
Plasma enhanced CVD of p-i-n tandem stack of amorphous hydrogenated silicon on metal foils for production of solar absorbing multi-layers.
Engineering and technology
The PECVD coating system is a roll-to-roll type production plant engineered for one-sided vacuum coating of up to 1,340 mm wide metal foils.
The deposition zone consists...
PECVD deposition machine / vacuum
Application
Plasma enhanced CVD of p-i-n tandem stack of amorphous hydrogenated silicon on metal foils for production of solar absorbing multi-layers.
Engineering and technology
The PECVD coating system is a roll-to-roll type production plant engineered for one-sided vacuum coating of up to 1,340 mm wide metal foils.
The deposition zone consists of one or more RF electrodes inside a gas-tight volume and is configured for upward deposition. The particular configuration of the deposition zones prevents cross-contamination.
Substrate is preheated before coating deposition, heated during the deposition process and cooled down after coating. Temperature gradients on foil do not exceed 4 oC/cm. Temperature on electrical devices, the curved plate and substrate is monitored with thermocouples and IR sensors.
Substrate is mechanically supported by a heated curved plate. The curved plate consists of several segments with a radius of curvature of 10 meters.
Irreversible winding system ensures optimized tension and foil handling without scratching and wrinkling.
The pumping system consists of mechanical booster and dry roughing pumps. The RF zones have separate, throttled pump lines to vary gas flows and pressure independently in each zone.
Two-level service platform, mobeable chamber door and RF electrodes ensure ease of maintenance.
The control system applies modular concept for easy extension of the control software.
Plasma enhanced CVD of p-i-n tandem stack of amorphous hydrogenated silicon on metal foils for production of solar absorbing multi-layers.
Engineering and technology
The PECVD coating system is a roll-to-roll type production plant engineered for one-sided vacuum coating of up to 1,340 mm wide metal foils.
The deposition zone consists of one or more RF electrodes inside a gas-tight volume and is configured for upward deposition. The particular configuration of the deposition zones prevents cross-contamination.
Substrate is preheated before coating deposition, heated during the deposition process and cooled down after coating. Temperature gradients on foil do not exceed 4 oC/cm. Temperature on electrical devices, the curved plate and substrate is monitored with thermocouples and IR sensors.
Substrate is mechanically supported by a heated curved plate. The curved plate consists of several segments with a radius of curvature of 10 meters.
Irreversible winding system ensures optimized tension and foil handling without scratching and wrinkling.
The pumping system consists of mechanical booster and dry roughing pumps. The RF zones have separate, throttled pump lines to vary gas flows and pressure independently in each zone.
Two-level service platform, mobeable chamber door and RF electrodes ensure ease of maintenance.
The control system applies modular concept for easy extension of the control software.
PECVD deposition machine
Application
The PECVD pilot coater is intended for producing p-i-n stacks of amorphous hydrogenated silicon on metal foils. The cotar is used as an experimentation tool for optimization of plasma enhanced chemical vapour deposition of...
The PECVD pilot coater is intended for producing p-i-n stacks of amorphous hydrogenated silicon on metal foils. The cotar is used as an experimentation tool for optimization of plasma enhanced chemical vapour deposition of...
PECVD deposition machine
Application
The PECVD pilot coater is intended for producing p-i-n stacks of amorphous hydrogenated silicon on metal foils. The cotar is used as an experimentation tool for optimization of plasma enhanced chemical vapour deposition of functional coatings and production of trial materials.
Engineering and Technology
The PECVD pilot coater is a roll-to-roll type plant engineered for one-sided vacuum coating of up to 350 mm wide metal foils.
The coating is deposited by an RF discharge. The deposition zone consists of an RF electrode inside a gas-tight volume. Contamination-free conditions are provided in the deposition zones.
Substrate is preheated before coating deposition, heated during the deposition process and cooled down after coating. Temperature gradients on foil do not exceed 4 oC/cm. Temperature on electrical devices, the curved plate and substrate is monitored with thermocouples and IR sensors.
The PECVD pilot coater is intended for producing p-i-n stacks of amorphous hydrogenated silicon on metal foils. The cotar is used as an experimentation tool for optimization of plasma enhanced chemical vapour deposition of functional coatings and production of trial materials.
Engineering and Technology
The PECVD pilot coater is a roll-to-roll type plant engineered for one-sided vacuum coating of up to 350 mm wide metal foils.
The coating is deposited by an RF discharge. The deposition zone consists of an RF electrode inside a gas-tight volume. Contamination-free conditions are provided in the deposition zones.
Substrate is preheated before coating deposition, heated during the deposition process and cooled down after coating. Temperature gradients on foil do not exceed 4 oC/cm. Temperature on electrical devices, the curved plate and substrate is monitored with thermocouples and IR sensors.
PECVD deposition machine / vacuum - PentaBlue
PentaBlue is a PECVD (Plasma Enhanced Chemical Vapour Deposition) coating system where the wafers are coated with an antireflection layer consisting...
PECVD deposition machine / vacuum - PentaBlue
PentaBlue is a PECVD (Plasma Enhanced Chemical Vapour Deposition) coating system where the wafers are coated with an antireflection layer consisting of silicon nitride. This technology uses a direct plasma reactor which achieves improved cell efficiency and higher density of Si-nitrate layer in comparison to the remote plasma reactor. The PentaBlue ensures an excellent surface passivation due to high process temperatures and the direct plasma process and guarantees a stable and reproducible process and is characterized by outstanding layer uniformity.