+7 (812) 645-08-06
Measuring instruments for electromagnetic fields
select brand
Electromagnetic field monitoring device - 8 GHz | 480846
Features:
* For electromagnetic field strength measurement including:
o Mobile phone base station antenna radiation
o RF power measurement for...
* For electromagnetic field strength measurement including:
o Mobile phone base station antenna radiation
o RF power measurement for...
Electromagnetic field monitoring device - 8 GHz | 480846
Features:
* For electromagnetic field strength measurement including:
o Mobile phone base station antenna radiation
o RF power measurement for transmitters
o Wireless LAN (Wi-Fi) detection/installation
o Wireless communication applications (CW, TDMA, GSM, DECT)
o Microwave leakage
* Measurement optimized for 900MHz, 1800MHz, 2.7GHz, 3.5GHz and 8GHz
* Non-directional (isotropic) measurement with three-channel (triaxial) measurement probe
* Max Hold and Average functions and level exceed audible alarm with user selectable threshold
* Manual store/recall up to 99 sets
* Complete with 9V battery and carrying case
* For electromagnetic field strength measurement including:
o Mobile phone base station antenna radiation
o RF power measurement for transmitters
o Wireless LAN (Wi-Fi) detection/installation
o Wireless communication applications (CW, TDMA, GSM, DECT)
o Microwave leakage
* Measurement optimized for 900MHz, 1800MHz, 2.7GHz, 3.5GHz and 8GHz
* Non-directional (isotropic) measurement with three-channel (triaxial) measurement probe
* Max Hold and Average functions and level exceed audible alarm with user selectable threshold
* Manual store/recall up to 99 sets
* Complete with 9V battery and carrying case
Radio frequency sensor - RFS100 series
INFICON RF sensor technology provides highly accurate, broadband, frequency discriminant RF measurement for semiconductor processing tools. This RF data provides detailed insight on actual plasma...
Radio frequency sensor - RFS100 series
INFICON RF sensor technology provides highly accurate, broadband, frequency discriminant RF measurement for semiconductor processing tools. This RF data provides detailed insight on actual plasma conditions of both process development and production process problems to significantly reduce process variability. The latest in its suite of advanced process control in situ sensors, this non-intrusive in-line cable mount RF sensor combines with FabGuard Sensor Integration and Analysis Systemto offer critical diagnostic information, e.g. accurate chamber and process power and impedance measurement, root cause analysis of faults (such as matching network problems), process fingerprinting for chamber matching, and wafer metrology modeling in PVD, CVD and etch applications.