Photolithography equipment - 15 mm², 11.23 x 18 mm, 2.0 µm | NES1h04

Photolithography equipment - 15 mm², 11.23 x 18 mm, 2.0 µm | NES1h04
Nikon Engineering The small-size highly cost effective Projection Exposure System has a number of advantages over conventional models, including the following:

* Significantly improved total throughput
* Easier to operate
* Smaller footprint and more compact design

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