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AFM microscope / atomic force / automated - XE-3DM
Automated Industrial AFM for High-Resolution 3D MetrologyPark Systems has introduced the revolutionary XE-3DM, the completely automated AFM system designed for overhang profiles, high-resolution sidewall imaging, and critical angle measurements. With the patented decoupled XY and Z scanning system with tilted Z-scanner, it overcomes the challenges of the normal and flare tip methods in accurate sidewall analysis. In utilizing our True Non-Contact Mode™, the XE-3DM enables non-destructive measurement of soft photoresist surfaces with high aspect ratio tips.
Accuracy Like Never Before
Shrinking form factors are driving the need to design at the nanoscale level in the semiconductor markets, but traditional metrology tools have lacked the accuracy needed for nanoscale design and manufacturing. Park Systems has met this challenge in industrial metrology with enabling breakthroughs: Crosstalk Elimination (XE) enables artifact-free and non-destructive imaging New 3D AFM enables high resolution imaging of sidewall or undercut features.
Throughput Like Never Before
AFMs that have enabled nanoscale design have traditionally not been fast enough for use in production quality control. That has changed with Park Systems' revolutionary gains in throughput, enabling AFMs for use in automatic in-line manufacturing. These include automatic tip exchange where our novel magnetic approach has a 99% success rate, higher than traditional vacuum techniques. Also, ful