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PVD deposition machine / magnetron sputtering - Atis 500
Vacuum system Atis 500 is designed for metal coatings application by magnetron sputtering on substrates measuring 60 x 48 mm with preliminary ion-beam treatment.Description of engineering solutions
Cyclic-action unit with cylindrical chamber 500 mm in diameter and 330 mm high. The chamber is accessed through folding top cover.
The chamber is equipped with cryogenic pump providing maximum fast evacuation and water vapours pump down. Forevacuum pump down is made by oil-free mechanical pump.
The chamber houses 9-positions substrate holder, one of which is intended for dusting of magnetrons. Dimensions of the holder allow to load for treatment up to 8 substrates measuring 60x48mm for two-side sputtering.
To clean substrates before coating in order to enhance adhesion two ion cleaning linear type ion sources having aperture of 140 mm are installed.
For deposition of sub-layer and main metal layer four direct current magnetrons with 150 mm diameter target are mounted inside the chamber.
Substrates are treated step-by-step. Sequence of treatment is set by operator (for example, first the sub-layer is deposited on all substrates, and then the main layer, or sub-layer and straight after the main layer is deposed on each substrate).
The unit is equipped with closed water cooling system (the duty of the customer is provision of distilled water only).
The system software allows to perform the technological process both manually on operator’s commands, and automatically according to the entered recipe.
The equipment we offer has output of 40 two-side sputtered substrates per shift, for example for structure Сr-Cu-Cr.