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PVD deposition machine / magnetron sputtering - 46 kVA | NESSY II
NESSY II is a second generation magnetron sputter system mainly used for the production of EUV extreme ultraviolet mirrors under UHV conditions. It is designed for mass production as well as the R&D of new products. The machine can be equipped with up to 6 different rectangular sputter cathodes and uses materials like Mo, Si and diffusion barrier layers. As a result, a complete coating stack can be performed in one cycle. Flat main and sub-rotation, as well as curved substrates, allow the coating to have an extremely high layer thickness uniformity or rotationally symmetric gradient layers.Fields of applications
EUV coating for collector optics
synchrotrons optics
x-ray astronomy
soft x-ray lasers
plasma physics