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• Plasma source for surface treatment / PVD / CVD - 3.2 kW, 160 V, 20 A | BS-80020CPPS

Plasma source for surface treatment / PVD / CVD - 3.2 kW, 160 V, 20 A | BS-80020CPPS

The plasma source in this product series is specialized for processes with a low temperature, such as plastic film or substrate. The film quality of vacuum deposited film can be improved by deposition assisted by plasma, with lower temperature increases of a substrate. The item can also be used for plasma treatment, such as for surface modification and cleaning.

The reflective deposition is made possible by electron beam-excited plasma, while the ARE technique (Activated Reactive Evaporation) promotes a highly effective discharge, in order to enhance the evaporation materials ionization. There are multiple modes of operation, including a CPPS mode, as well as a normal plasma mode.

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