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• Plasma source for surface treatment / CVD / PVD - 6 kW, 160 V, 38 A | BS-80011BPG

Plasma source for surface treatment / CVD / PVD - 6 kW, 160 V, 38 A | BS-80011BPG

The plasma source in this series can be incorporated into a vacuum chamber, generating high-density plasma. This product can also be used as a plasma-assisted deposition unit, making it possible to improve the properties of the film for applications such as optical thin films, protective and function films.

The product can also be used for the treatment of plasma, such as surface modification and cleaning, while the large-current, low-voltage plasma enables ionization and exciting gas molecule and evaporated particles, with the possibility of reactive deposition.

Finally, the high-rate deposition to a large area is possible because high-density plasma can also be generated in a mass space.

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