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Plasma cleaning machine - 400 W |PE-75
The PE-75 plasma cleaner is made for smaller production facilities, R&D facilities, and universities. This system features a circular aluminum vacuum chamber that is 12" in diameter and 11" deep with a direct powered RF electrode.Features
As in all Plasma Etch Systems, a capacitive parallel plate design is used for the most effective plasma generation. Competitive plasma cleaners with glass or quarts barrel chambers cannot penetrate the vacuum containment vessel and therefor are restricted to inductive coupling using an RF coil wrapped around the exterior of the chamber. This is an inefficient method resulting in loss of power input and considerably lower etch and clean removal rates.
The PE-75 is comprised of components made in the USA and is built in our Carson City, NV headquarters with some of the best customer service available in the industry.