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ECR plasma engraving system / for silicone - M-6000 Series
M-600/6000 conductor etch system provides functional solution for power devices that requires silicon element removal on trenches for mobile workstations, domestic electrical fixtures, automobiles, trains, and the like. It adapts a low-temperature mechanism and TM bias technology with electron cyclotron resonance plasma of high density composition, which enables neat processing and stellar trench profiles.