The Asymmetric P-Nylon filter boasts the use of Nylon membranes which have been developed to eliminate defects, and has been refined into an asymmetric pore geometry. It has been constructed with a tapered pore design with an open upstream structure. It is also equipped with a fine downstream region that promotes extremely low operating pressures.
The Nylon Effect1 can be utilized in all lithography applications, and is specially developed to eliminate microbridge and cone defects in 193 nm resist and BARC chemistries. These filters can significantly reduce defects in a clean room setting, and eliminate defects by sieving and absorption. The units are also naturally hydrophilic, quick venting, low extractables and are 100% integrity tested.